NanoMaker is a powerful software/hardware system for SEM/FIB based
lithography that is intended for state-of-the-art technology of designing
and manufacturing micro and nano electronic devices and objects.
Why NanoMaker?
NanoMaker provides a unique set of tools for nanotechnologies.
It is supplied with friendly graphic editor to design hierarchical
structures of any size and shape arranged to any level of complexity.
Compensates static distortion of e-beam deflecting system.
Significantly reduces total exposure time by actively suppressing
dynamic delays of e-beam deflection.
Allows writing without beam blanking.
Seamlessly integrates Monte
Carlo calculation to define exposure recommended parameters for
multilayered resist-substrate systems.
Can be used as diagnostic tool for creation of high-resolution panoramic
view of large-scale (centimeters) micro objects.
Purposes:
To convert any scanning electron microscope (SEM) into an e-beam lithograph.
To provide an ultimate resolution of lithography with a certain setup (including
industrial lithographs). To achieve this:
make correction for proximity effect during data preparation for lithography
compensate for the distortion and delays of scanning system during exposure
and image acquisition
compensate for the system drift at prolonged exposure
To predict results of lithography by simulating.
To ensure adjustment for various configurations of lithographic equipment,
for the presence or absence of beam blanking systems, stages, etc.
To create three-dimensional structures in a resist.
To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
February, 2011
NanoMaker was sucessfully hooked on Zeiss Orion helium-ion microscope at the St. Petersburg State University. During installation several tests were carried out to assess the possibilities...
May, 2008SEMTech Solutions Inc. will present NanoMaker at the international conferences and tradeshows on Electron,...
Archives
In product:
January, 2012
The new release of the NanoMaker software is prepared in which the optimization of large blocks of data is made by presenting them as B-trees, that dramatically speeded up the work...
June, 2011
Pattern Generator Elli30 is developed with main aim to improve performance speed of the PGs.
Now Elli30 provides writing speed up to 20MHz (20 megaspots per sec) at 16 bit positioning.
November, 2009
Now NanoMaker can export proximity corrected data to NPGS. The new option starts with DXF/GDSII data import and after proximity correction prepares data in RF6 and DC2 formats, which...
Archives
On site:
February, 2012
A few spectacular photos of nanometer size features produced by
Zeiss Orion helium-ion microscope controlled by NanoMaker...
