NanoMaker is a powerful software/hardware system for SEM/FIB based
lithography that is intended for state-of-the-art technology of designing
and manufacturing micro and nano electronic devices and objects.
Why NanoMaker?
NanoMaker provides a unique set of tools for nanotechnologies.
It is supplied with friendly graphic editor to design hierarchical
structures of any size and shape arranged to any level of complexity.
Compensates static distortion of e-beam deflecting system.
Significantly reduces total exposure time by actively suppressing
dynamic delays of e-beam deflection.
Allows writing without beam blanking.
Seamlessly integrates Monte
Carlo calculation to define exposure recommended parameters for
multilayered resist-substrate systems.
Can be used as diagnostic tool for creation of high-resolution panoramic
view of large-scale (centimeters) micro objects.
Purposes:
To convert any scanning electron microscope (SEM) into an e-beam lithograph.
To provide an ultimate resolution of lithography with a certain setup (including
industrial lithographs). To achieve this:
make correction for proximity effect during data preparation for lithography
compensate for the distortion and delays of scanning system during exposure
and image acquisition
compensate for the system drift at prolonged exposure
To predict results of lithography by simulating.
To ensure adjustment for various configurations of lithographic equipment,
for the presence or absence of beam blanking systems, stages, etc.
To create three-dimensional structures in a resist.
To familiarize user with the basic principles of lithography.
What is new?
Events:
May, 2008SEMTech Solutions Inc. will present NanoMaker at the international conferences and tradeshows on Electron,...
April, 2008
Interface Ltd. has signed a contract with SEMTech Solutions Inc., USA company, to exclusively promote the NanoMaker in North America.
SEMTech Solutions is headquarted in Billerica,...
Archives
In product:
November, 2009
Now NanoMaker can export proximity corrected data to NPGS. The new option starts with DXF/GDSII data import and after proximity correction prepares data in RF6 and DC2 formats, which...
June, 2009
The procedure of resist development simulation was advanced. The new parameter - Eta0 (η0) is added to proximity function calculation, allowing to consider dose changes with resist depth.
May, 2009
The optional module to calculate proximity function for multilayered substrates is created. The calculation by Monte-Carlo method takes less then 5 minutes. The calculated distribution...
Archives
On site:
March, 2010
Some topics from correspondence with our users have been added in section Q&A of our site.
February, 2010
A few pictures illustrating selective growth of single-walled carbon nanotubes and fabrication of device prototypes...
January, 2010
NanoMaker provides subfields stitching better than 100nm using only a conventional mechanical stage. Given example demonstrates that NanoMaker allows one to perform exposure of large...
Archives
Scanning Electron Microscope controlled by NanoMaker
Applications
Microelectronics
Nanotechnology
3D nano-micro patterning
Diffractive optics (synthetic holograms) for visible and X-ray range
